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Title: Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO 2 Films

Abstract

Ultrathin and continuous epitaxial films with relaxed lattice strain can potentially maintain more of its bulk physical and chemical properties and are useful as buffer layers. We study surface, interface, and microstructural properties of ultrathin ( 10–12 unit cells thick) epitaxial ceria films grown on single crystal YSZ substrates. The out-of -plane and in-plane lattice parameters indicate relaxation in the continuous film due to misfit dislocations seen by high-resolution transmission electron microscopy (HRTEM) and substrate roughness of 1-2 unit cells, confirmed by atomic force microscopy and HRTEM. A combination of secondary sputtering, lattice mismatch, substrate roughness, and surface reduction creating secondary phase was likely the cause of surface roughness which should be reduced to a minimum level for effective use of it as buffer layers.

Authors:
 [1];  [1];  [1];  [1]
  1. Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, Richland WA 99352, USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Biological and Environmental Research (BER) (SC-23)
OSTI Identifier:
1198286
Grant/Contract Number:  
AC06-76RLO1830; AC06-76RL01830
Resource Type:
Journal Article: Published Article
Journal Name:
Research Letters in Materials Science
Additional Journal Information:
Journal Name: Research Letters in Materials Science Journal Volume: 2008; Journal ID: ISSN 1687-6822
Publisher:
Hindawi Publishing Corporation
Country of Publication:
Country unknown/Code not available
Language:
English

Citation Formats

Saraf, L. V., Wang, C. M., Engelhard, M. H., and Nachimuthu, P. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO 2 Films. Country unknown/Code not available: N. p., 2008. Web. doi:10.1155/2008/206019.
Saraf, L. V., Wang, C. M., Engelhard, M. H., & Nachimuthu, P. Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO 2 Films. Country unknown/Code not available. doi:10.1155/2008/206019.
Saraf, L. V., Wang, C. M., Engelhard, M. H., and Nachimuthu, P. Tue . "Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO 2 Films". Country unknown/Code not available. doi:10.1155/2008/206019.
@article{osti_1198286,
title = {Surface and Interface Properties of 10–12 Unit Cells Thick Sputter Deposited Epitaxial CeO 2 Films},
author = {Saraf, L. V. and Wang, C. M. and Engelhard, M. H. and Nachimuthu, P.},
abstractNote = {Ultrathin and continuous epitaxial films with relaxed lattice strain can potentially maintain more of its bulk physical and chemical properties and are useful as buffer layers. We study surface, interface, and microstructural properties of ultrathin ( ∼ 10–12 unit cells thick) epitaxial ceria films grown on single crystal YSZ substrates. The out-of -plane and in-plane lattice parameters indicate relaxation in the continuous film due to misfit dislocations seen by high-resolution transmission electron microscopy (HRTEM) and substrate roughness of ∼ 1-2 unit cells, confirmed by atomic force microscopy and HRTEM. A combination of secondary sputtering, lattice mismatch, substrate roughness, and surface reduction creating secondary phase was likely the cause of surface roughness which should be reduced to a minimum level for effective use of it as buffer layers.},
doi = {10.1155/2008/206019},
journal = {Research Letters in Materials Science},
issn = {1687-6822},
number = ,
volume = 2008,
place = {Country unknown/Code not available},
year = {2008},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1155/2008/206019

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