U.S. Department of EnergyOffice of Scientific and Technical Information
Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning
Abstract
We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ~ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ~ 0.1 at 150 °C). Furthermore, performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.
- Authors:
-
- Univ. of California, Santa Barbara, CA (United States)
- Univ. of California, Santa Barbara, CA (United States); Inha Univ., Incheon (Korea)
- Dow Electronic Materials, Marlborough, MA (United States)
- The Dow Chemical Company, Midland, MI (United States)
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- National Science Foundation (NSF)
- OSTI Identifier:
- 1186927
- Grant/Contract Number:
- DMR-1121053
- Resource Type:
- Journal Article: Accepted Manuscript
- Journal Name:
- Macromolecules
- Additional Journal Information:
- Journal Volume: 48; Journal Issue: 11; Journal ID: ISSN 0024-9297
- Publisher:
- American Chemical Society
- Country of Publication:
- United States
- Language:
- ENGLISH
- Subject:
- 36 MATERIALS SCIENCE; morphology; thin films; X-ray scattering; solvents; organic compounds
Citation Formats
Luo, Yingdong, Montarnal, Damien, Kim, Sangwon, Shi, Weichao, Barteau, Katherine P., Pester, Christian W., Hustad, Phillip D., Christianson, Matthew D., Fredrickson, Glenn H., Kramer, Edward J., and Hawker, Craig J. Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning. United States: N. p., 2015.
Web. doi:10.1021/acs.macromol.5b00518.
Luo, Yingdong, Montarnal, Damien, Kim, Sangwon, Shi, Weichao, Barteau, Katherine P., Pester, Christian W., Hustad, Phillip D., Christianson, Matthew D., Fredrickson, Glenn H., Kramer, Edward J., & Hawker, Craig J. Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning. United States. https://doi.org/10.1021/acs.macromol.5b00518
Luo, Yingdong, Montarnal, Damien, Kim, Sangwon, Shi, Weichao, Barteau, Katherine P., Pester, Christian W., Hustad, Phillip D., Christianson, Matthew D., Fredrickson, Glenn H., Kramer, Edward J., and Hawker, Craig J. 2015.
"Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning". United States. https://doi.org/10.1021/acs.macromol.5b00518. https://www.osti.gov/servlets/purl/1186927.
@article{osti_1186927,
title = {Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning},
author = {Luo, Yingdong and Montarnal, Damien and Kim, Sangwon and Shi, Weichao and Barteau, Katherine P. and Pester, Christian W. and Hustad, Phillip D. and Christianson, Matthew D. and Fredrickson, Glenn H. and Kramer, Edward J. and Hawker, Craig J.},
abstractNote = {We report herein the modular synthesis and nanolithographic potential of poly(dimethylsiloxane-block-methyl methacrylate) (PDMS-b-PMMA) with self-assembled domains approaching sub-10 nm periods. A straightforward and modular coupling strategy, optimized for low molecular weight diblocks and using copper-catalyzed azide–alkyne “click” cycloaddition, was employed to obtain a library of PDMS-b-PMMA and poly(dimethylsiloxane-block-styrene) (PDMS-b-PS) diblock copolymers. Flory–Huggins interaction parameters, determined from small-angle X-ray scattering experiments, were high for PDMS-b-PMMA (χ ~ 0.2 at 150 °C), suggesting this diblock copolymer system has promise for sub-10 nm lithographic applications when compared to the corresponding PDMS-b-PS diblock copolymers (χ ~ 0.1 at 150 °C). Furthermore, performance evaluation in thin film self-assembly experiments allowed domain periods as small as 12.1 nm to be obtained, which is among the smallest highly ordered nanoscale patterns reported hitherto for thermally annealed materials.},
doi = {10.1021/acs.macromol.5b00518},
url = {https://www.osti.gov/biblio/1186927},
journal = {Macromolecules},
issn = {0024-9297},
number = 11,
volume = 48,
place = {United States},
year = {Tue May 19 00:00:00 EDT 2015},
month = {Tue May 19 00:00:00 EDT 2015}
}
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