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Title: Chemical reactivity of CVC and CVD SiC with UO 2 at high temperatures

Abstract

Two types of silicon carbide (SiC) synthesized using two different vapor deposition processes were embedded in UO 2 pellets and evaluated for their potential chemical reaction with UO 2. While minor reactivity between chemical-vapor-composited (CVC) SiC and UO 2 was observed at comparatively low temperatures of 1100 and 1300 C, chemical-vapor-deposited (CVD) SiC did not show any such reactivity, according to microstructural investigations. But, both CVD and CVC SiCs showed some reaction with UO 2 at a higher temperature (1500 C). Elemental maps supported by phase maps obtained using electron backscatter diffraction indicated that CVC SiC was more reactive than CVD SiC at 1500 C. Moreover, this investigation indicated the formation of uranium carbides and uranium silicide chemical phases such as UC, USi 2, and U 3Si 2 as a result of SiC reaction with UO 2.

Authors:
 [1];  [1];  [1];  [1]
  1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE Office of Nuclear Energy (NE)
OSTI Identifier:
1185795
Alternate Identifier(s):
OSTI ID: 1252363
Grant/Contract Number:
AC05-00OR22725
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of Nuclear Materials
Additional Journal Information:
Journal Volume: 460; Journal Issue: C; Journal ID: ISSN 0022-3115
Publisher:
Elsevier
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; Uranium dioxide; CVC SiC

Citation Formats

Silva, Chinthaka M., Katoh, Yutai, Voit, Stewart L., and Snead, Lance L. Chemical reactivity of CVC and CVD SiC with UO2 at high temperatures. United States: N. p., 2015. Web. doi:10.1016/j.jnucmat.2015.02.002.
Silva, Chinthaka M., Katoh, Yutai, Voit, Stewart L., & Snead, Lance L. Chemical reactivity of CVC and CVD SiC with UO2 at high temperatures. United States. doi:10.1016/j.jnucmat.2015.02.002.
Silva, Chinthaka M., Katoh, Yutai, Voit, Stewart L., and Snead, Lance L. Wed . "Chemical reactivity of CVC and CVD SiC with UO2 at high temperatures". United States. doi:10.1016/j.jnucmat.2015.02.002. https://www.osti.gov/servlets/purl/1185795.
@article{osti_1185795,
title = {Chemical reactivity of CVC and CVD SiC with UO2 at high temperatures},
author = {Silva, Chinthaka M. and Katoh, Yutai and Voit, Stewart L. and Snead, Lance L.},
abstractNote = {Two types of silicon carbide (SiC) synthesized using two different vapor deposition processes were embedded in UO2 pellets and evaluated for their potential chemical reaction with UO2. While minor reactivity between chemical-vapor-composited (CVC) SiC and UO2 was observed at comparatively low temperatures of 1100 and 1300 C, chemical-vapor-deposited (CVD) SiC did not show any such reactivity, according to microstructural investigations. But, both CVD and CVC SiCs showed some reaction with UO2 at a higher temperature (1500 C). Elemental maps supported by phase maps obtained using electron backscatter diffraction indicated that CVC SiC was more reactive than CVD SiC at 1500 C. Moreover, this investigation indicated the formation of uranium carbides and uranium silicide chemical phases such as UC, USi2, and U3Si2 as a result of SiC reaction with UO2.},
doi = {10.1016/j.jnucmat.2015.02.002},
journal = {Journal of Nuclear Materials},
number = C,
volume = 460,
place = {United States},
year = {Wed Feb 11 00:00:00 EST 2015},
month = {Wed Feb 11 00:00:00 EST 2015}
}

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