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Title: Adhesion and Wetting of Soft Nanoparticles on Textured Surfaces: Transition between Wenzel and Cassie-Baxter States

Abstract

We use a combination of the molecular dynamics simulations and scaling analysis to study interactions between gel-like nanoparticles and substrates covered with rectangular shape posts. Our simulations have shown that nanoparticle in contact with substrate undergo first order transition between Wenzel and Cassie-Baxter state which location depends on nanoparticle shear modulus, the strength of nanoparticle-substrate interactions, height of the substrate posts and nanoparticle size, R p. There is a range of system parameters where these two states coexist such that the average indentation δ produced by substrate posts changes monotonically with nanoparticle shear modulus, G p. We have developed a scaling model that describes deformation of nanoparticle in contact with patterned substrate. In the framework of this model the effect of the patterned substrate can be taken into account by introducing an effective work of adhesion, W eff, which describes the first order transition between Wenzel and Cassie-Baxter states. There are two different shape deformation regimes for nanoparticles with shear modulus G p and surface tension γ p. Shape of small nanoparticles with size R p < γ p 3/2G p -1 W eff -1/2 is controlled by capillary forces while deformation of large nanoparticles, R p > γ pmore » 3/2G p -1 W eff -1/2« less

Authors:
 [1];  [2];  [3];  [1]
  1. Univ. of Connecticut, Storrs, CT (United States). Polymer Program and Inst. of Materials Science
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States). Center for integrated Nanotechnologies
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). National Center for Computational Science
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1185005
Report Number(s):
SAND-2014-20413J
Journal ID: ISSN 0743-7463; 547747
Grant/Contract Number:
AC04-94AL85000
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Langmuir
Additional Journal Information:
Journal Volume: 31; Journal Issue: 5; Journal ID: ISSN 0743-7463
Publisher:
American Chemical Society
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Cao, Zhen, Stevens, Mark J., Carrillo, Jan-Michael Y., and Dobrynin, Andrey V.. Adhesion and Wetting of Soft Nanoparticles on Textured Surfaces: Transition between Wenzel and Cassie-Baxter States. United States: N. p., 2015. Web. doi:10.1021/la5045442.
Cao, Zhen, Stevens, Mark J., Carrillo, Jan-Michael Y., & Dobrynin, Andrey V.. Adhesion and Wetting of Soft Nanoparticles on Textured Surfaces: Transition between Wenzel and Cassie-Baxter States. United States. doi:10.1021/la5045442.
Cao, Zhen, Stevens, Mark J., Carrillo, Jan-Michael Y., and Dobrynin, Andrey V.. Fri . "Adhesion and Wetting of Soft Nanoparticles on Textured Surfaces: Transition between Wenzel and Cassie-Baxter States". United States. doi:10.1021/la5045442. https://www.osti.gov/servlets/purl/1185005.
@article{osti_1185005,
title = {Adhesion and Wetting of Soft Nanoparticles on Textured Surfaces: Transition between Wenzel and Cassie-Baxter States},
author = {Cao, Zhen and Stevens, Mark J. and Carrillo, Jan-Michael Y. and Dobrynin, Andrey V.},
abstractNote = {We use a combination of the molecular dynamics simulations and scaling analysis to study interactions between gel-like nanoparticles and substrates covered with rectangular shape posts. Our simulations have shown that nanoparticle in contact with substrate undergo first order transition between Wenzel and Cassie-Baxter state which location depends on nanoparticle shear modulus, the strength of nanoparticle-substrate interactions, height of the substrate posts and nanoparticle size, Rp. There is a range of system parameters where these two states coexist such that the average indentation δ produced by substrate posts changes monotonically with nanoparticle shear modulus, Gp. We have developed a scaling model that describes deformation of nanoparticle in contact with patterned substrate. In the framework of this model the effect of the patterned substrate can be taken into account by introducing an effective work of adhesion, Weff, which describes the first order transition between Wenzel and Cassie-Baxter states. There are two different shape deformation regimes for nanoparticles with shear modulus Gp and surface tension γp. Shape of small nanoparticles with size Rp < γp 3/2Gp-1 Weff-1/2 is controlled by capillary forces while deformation of large nanoparticles, Rp > γp 3/2Gp-1 Weff-1/2},
doi = {10.1021/la5045442},
journal = {Langmuir},
number = 5,
volume = 31,
place = {United States},
year = {Fri Jan 16 00:00:00 EST 2015},
month = {Fri Jan 16 00:00:00 EST 2015}
}

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