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Title: The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm

Journal Article · · Proceedings of SPIE
DOI:https://doi.org/10.1117/12.917386· OSTI ID:1183189

Research Organization:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC02-05CH11231
OSTI ID:
1183189
Report Number(s):
LBNL-5491E
Journal Information:
Proceedings of SPIE, Vol. 8322; Related Information: Journal Publication Date: March 2012
Country of Publication:
United States
Language:
English

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