Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces

Tong, Sheng; Park, Woon Ik; Choi, Yoon-Young; Stan, Liliana; Hong, Seungbum; Roelofs, Andreas

doi:10.1103/PhysRevApplied.3.014003

Title: Mechanical Removal and Rescreening of Local Screening Charges at Ferroelectric Surfaces

Journal Article · Tue Jan 20 00:00:00 EST 2015 · Physical Review Applied

DOI:https://doi.org/10.1103/PhysRevApplied.3.014003· OSTI ID:1357474

Tong, Sheng ^[1]; Park, Woon Ik ^[2]; Choi, Yoon-Young ^[2]; Stan, Liliana ^[1]; Hong, Seungbum ^[2]; Roelofs, Andreas ^[1]

Argonne National Lab. (ANL), Argonne, IL (United States). Nanoscience and Technology Division
Argonne National Lab. (ANL), Argonne, IL (United States). Materials Science Division

In this paper, we report the kinetics of screening charge removal and rescreening on periodically poled lithium niobate using charge-gradient microscopy and electrostatic force microscopy (EFM). A minimum pressure needs to be applied to initiate mechanical screening charge removal, and increasing the pressure leads to further removal of charge until a threshold is reached when all screening charges are removed. We fit all rescreening EFM contrast curves under various pressures into a universal exponential decay. Finally, the findings imply that we can control the screening degree of ferroelectric surfaces by mechanical means without affecting the polarization underneath.

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Research Organization:: Argonne National Laboratory (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1357474

Alternate ID(s):: OSTI ID: 1180365

Journal Information:: Physical Review Applied, Vol. 3, Issue 1; ISSN 2331-7019

Publisher:: American Physical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 19 works

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