Method for masking selected regions of a substrate
Patent
·
OSTI ID:1176267
Described herein is a method for providing a clean edge at the interface of a portion of a substrate coated with a coating system and an adjacent portion of the substrate which is uncoated. The method includes the step of forming a zone of non-adherence on the substrate portion which is to be uncoated, prior to application of the coating system. The zone of non-adherence is adjacent the interface, so that the coating system will not adhere to the zone of non-adherence, but will adhere to the portion of the substrate which is to be coated with the coating system.
- Research Organization:
- General Electric Company, Niskayuna, NY (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FC21-95MC31176
- Assignee:
- General Electric Company (Niskayuna, NY)
- Patent Number(s):
- 7,709,057
- Application Number:
- 10/409,523
- OSTI ID:
- 1176267
- Country of Publication:
- United States
- Language:
- English
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