Methods and devices for fabricating three-dimensional nanoscale structures

Rogers, John A.; Jeon, Seokwoo; Park, Jangung

Methods and devices for fabricating three-dimensional nanoscale structures

Patent · 27 April 2010

OSTI ID:1176254

Rogers, John A.; Jeon, Seokwoo; Park, Jangung

The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.

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Research Organization:: Univ. of Illinois, Urbana, IL (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-91ER45439

Assignee:: The Board of Trustees of the University of Illinois (Urbana, IL)

Patent Number(s):: 7,704,684

Application Number:: 11/001,689

OSTI ID:: 1176254

Country of Publication:: United States

Language:: English

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