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Title: Methods and devices for fabricating three-dimensional nanoscale structures

Abstract

The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.

Inventors:
; ;
Publication Date:
Research Org.:
The Board of Trustees of the University of Illinois, Urbana, IL (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1176254
Patent Number(s):
7,704,684
Application Number:
11/001,689
Assignee:
The Board of Trustees of the University of Illinois (Urbana, IL) OSTI
DOE Contract Number:  
FG02-91ER45439
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Rogers, John A., Jeon, Seokwoo, and Park, Jangung. Methods and devices for fabricating three-dimensional nanoscale structures. United States: N. p., 2010. Web.
Rogers, John A., Jeon, Seokwoo, & Park, Jangung. Methods and devices for fabricating three-dimensional nanoscale structures. United States.
Rogers, John A., Jeon, Seokwoo, and Park, Jangung. Tue . "Methods and devices for fabricating three-dimensional nanoscale structures". United States. https://www.osti.gov/servlets/purl/1176254.
@article{osti_1176254,
title = {Methods and devices for fabricating three-dimensional nanoscale structures},
author = {Rogers, John A. and Jeon, Seokwoo and Park, Jangung},
abstractNote = {The present invention provides methods and devices for fabricating 3D structures and patterns of 3D structures on substrate surfaces, including symmetrical and asymmetrical patterns of 3D structures. Methods of the present invention provide a means of fabricating 3D structures having accurately selected physical dimensions, including lateral and vertical dimensions ranging from 10s of nanometers to 1000s of nanometers. In one aspect, methods are provided using a mask element comprising a conformable, elastomeric phase mask capable of establishing conformal contact with a radiation sensitive material undergoing photoprocessing. In another aspect, the temporal and/or spatial coherence of electromagnetic radiation using for photoprocessing is selected to fabricate complex structures having nanoscale features that do not extend entirely through the thickness of the structure fabricated.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Apr 27 00:00:00 EDT 2010},
month = {Tue Apr 27 00:00:00 EDT 2010}
}

Patent:

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