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Title: Negative ion source with external RF antenna

Abstract

A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source. A converter can be included in the ion source to produce negative ions.

Inventors:
; ;
Publication Date:
Research Org.:
The Regents of the University of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1176106
Patent Number(s):
7,176,469
Application Number:
10/656,848
Assignee:
The Regents of the University of California (Oakland, CA) OSTI
DOE Contract Number:
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Leung, Ka-Ngo, Hahto, Sami K., and Hahto, Sari T. Negative ion source with external RF antenna. United States: N. p., 2007. Web.
Leung, Ka-Ngo, Hahto, Sami K., & Hahto, Sari T. Negative ion source with external RF antenna. United States.
Leung, Ka-Ngo, Hahto, Sami K., and Hahto, Sari T. Tue . "Negative ion source with external RF antenna". United States. doi:. https://www.osti.gov/servlets/purl/1176106.
@article{osti_1176106,
title = {Negative ion source with external RF antenna},
author = {Leung, Ka-Ngo and Hahto, Sami K. and Hahto, Sari T.},
abstractNote = {A radio frequency (RF) driven plasma ion source has an external RF antenna, i.e. the RF antenna is positioned outside the plasma generating chamber rather than inside. The RF antenna is typically formed of a small diameter metal tube coated with an insulator. An external RF antenna assembly is used to mount the external RF antenna to the ion source. The RF antenna tubing is wound around the external RF antenna assembly to form a coil. The external RF antenna assembly is formed of a material, e.g. quartz, which is essentially transparent to the RF waves. The external RF antenna assembly is attached to and forms a part of the plasma source chamber so that the RF waves emitted by the RF antenna enter into the inside of the plasma chamber and ionize a gas contained therein. The plasma ion source is typically a multi-cusp ion source. A converter can be included in the ion source to produce negative ions.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Feb 13 00:00:00 EST 2007},
month = {Tue Feb 13 00:00:00 EST 2007}
}

Patent:

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