skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction

Abstract

A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas.

Inventors:
Publication Date:
Research Org.:
The Regents of the University of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175795
Patent Number(s):
7,063,819
Application Number:
10/395,046
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Rosocha, Louis A. Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction. United States: N. p., 2006. Web.
Rosocha, Louis A. Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction. United States.
Rosocha, Louis A. Tue . "Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction". United States. https://www.osti.gov/servlets/purl/1175795.
@article{osti_1175795,
title = {Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction},
author = {Rosocha, Louis A.},
abstractNote = {A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2006},
month = {6}
}

Patent:

Save / Share:

Works referenced in this record:

Reduction of NO/sub x/ from combustion flue gases by superimposed barrier discharge plasma reactors
journal, January 1997

  • Urashima, K.; Chang, J. -S.; Ito, T.
  • IEEE Transactions on Industry Applications, Vol. 33, Issue 4
  • DOI: 10.1109/28.605727

Acid Gas Removal Characteristics of Corona Discharge Methane Radical Shower-Catalyst Hybrid System for Treatment of Jet Engine Test Cell Flue Gas
conference, October 1999

  • Urashima, K.; Tong, X.; Chang, J. S.
  • International Fuels & Lubricants Meeting & Exposition, SAE Technical Paper Series
  • DOI: 10.4271/1999-01-3634

Removal of NOx from flue gas by corona discharge activated methane radical showers
journal, June 1997


Simultaneous removal of NO x and SO 2 from NO-SO 2 -CO 2 -N 2 -O 2 gas mixtures by corona radical shower systems
journal, January 1999


Time dependence of NO/sub x/ removal rate by a corona radical shower system
journal, January 1996

  • Ohkubo, T.; Kanazawa, S.; Nomoto, Y.
  • IEEE Transactions on Industry Applications, Vol. 32, Issue 5
  • DOI: 10.1109/28.536866

NO/NOx removal with C2 H2 as additive via dielectric barrier discharges
journal, May 2001