skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Ultra-short ion and neutron pulse production

Abstract

An ion source has an extraction system configured to produce ultra-short ion pulses, i.e. pulses with pulse width of about 1 .mu.s or less, and a neutron source based on the ion source produces correspondingly ultra-short neutron pulses. To form a neutron source, a neutron generating target is positioned to receive an accelerated extracted ion beam from the ion source. To produce the ultra-short ion or neutron pulses, the apertures in the extraction system of the ion source are suitably sized to prevent ion leakage, the electrodes are suitably spaced, and the extraction voltage is controlled. The ion beam current leaving the source is regulated by applying ultra-short voltage pulses of a suitable voltage on the extraction electrode.

Inventors:
; ;
Publication Date:
Research Org.:
The Regents of the University of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175620
Patent Number(s):
6,985,553
Application Number:
10/350,573
Assignee:
The Regents of the University of California (Oakland, CA) OSTI
DOE Contract Number:
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Leung, Ka-Ngo, Barletta, William A., and Kwan, Joe W. Ultra-short ion and neutron pulse production. United States: N. p., 2006. Web.
Leung, Ka-Ngo, Barletta, William A., & Kwan, Joe W. Ultra-short ion and neutron pulse production. United States.
Leung, Ka-Ngo, Barletta, William A., and Kwan, Joe W. Tue . "Ultra-short ion and neutron pulse production". United States. doi:. https://www.osti.gov/servlets/purl/1175620.
@article{osti_1175620,
title = {Ultra-short ion and neutron pulse production},
author = {Leung, Ka-Ngo and Barletta, William A. and Kwan, Joe W.},
abstractNote = {An ion source has an extraction system configured to produce ultra-short ion pulses, i.e. pulses with pulse width of about 1 .mu.s or less, and a neutron source based on the ion source produces correspondingly ultra-short neutron pulses. To form a neutron source, a neutron generating target is positioned to receive an accelerated extracted ion beam from the ion source. To produce the ultra-short ion or neutron pulses, the apertures in the extraction system of the ion source are suitably sized to prevent ion leakage, the electrodes are suitably spaced, and the extraction voltage is controlled. The ion beam current leaving the source is regulated by applying ultra-short voltage pulses of a suitable voltage on the extraction electrode.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jan 10 00:00:00 EST 2006},
month = {Tue Jan 10 00:00:00 EST 2006}
}

Patent:

Save / Share: