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Title: Direct-patterned optical waveguides on amorphous silicon films

Abstract

An optical waveguide structure is formed by embedding a core material within a medium of lower refractive index, i.e. the cladding. The optical index of refraction of amorphous silicon (a-Si) and polycrystalline silicon (p-Si), in the wavelength range between about 1.2 and about 1.6 micrometers, differ by up to about 20%, with the amorphous phase having the larger index. Spatially selective laser crystallization of amorphous silicon provides a mechanism for controlling the spatial variation of the refractive index and for surrounding the amorphous regions with crystalline material. In cases where an amorphous silicon film is interposed between layers of low refractive index, for example, a structure comprised of a SiO.sub.2 substrate, a Si film and an SiO.sub.2 film, the formation of guided wave structures is particularly simple.

Inventors:
; ; ; ;
Publication Date:
Research Org.:
The Regents of the University of California, Oakland, CA (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175452
Patent Number(s):
6,925,216
Application Number:
10/676,876
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., and Hau-Riege, Stefan. Direct-patterned optical waveguides on amorphous silicon films. United States: N. p., 2005. Web.
Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., & Hau-Riege, Stefan. Direct-patterned optical waveguides on amorphous silicon films. United States.
Vernon, Steve, Bond, Tiziana C., Bond, Steven W., Pocha, Michael D., and Hau-Riege, Stefan. Tue . "Direct-patterned optical waveguides on amorphous silicon films". United States. https://www.osti.gov/servlets/purl/1175452.
@article{osti_1175452,
title = {Direct-patterned optical waveguides on amorphous silicon films},
author = {Vernon, Steve and Bond, Tiziana C. and Bond, Steven W. and Pocha, Michael D. and Hau-Riege, Stefan},
abstractNote = {An optical waveguide structure is formed by embedding a core material within a medium of lower refractive index, i.e. the cladding. The optical index of refraction of amorphous silicon (a-Si) and polycrystalline silicon (p-Si), in the wavelength range between about 1.2 and about 1.6 micrometers, differ by up to about 20%, with the amorphous phase having the larger index. Spatially selective laser crystallization of amorphous silicon provides a mechanism for controlling the spatial variation of the refractive index and for surrounding the amorphous regions with crystalline material. In cases where an amorphous silicon film is interposed between layers of low refractive index, for example, a structure comprised of a SiO.sub.2 substrate, a Si film and an SiO.sub.2 film, the formation of guided wave structures is particularly simple.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2005},
month = {8}
}

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