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Title: Method & apparatus for monitoring plasma processing operations

Abstract

The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.

Inventors:
; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175081
Patent Number(s):
6,805,810
Application Number:
10/108,193
Assignee:
Sandia Corporation SNL-L
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Smith, Jr., Michael Lane, Ward, Pamela Denise, and Stevenson, Joel O'Don. Method & apparatus for monitoring plasma processing operations. United States: N. p., 2004. Web.
Smith, Jr., Michael Lane, Ward, Pamela Denise, & Stevenson, Joel O'Don. Method & apparatus for monitoring plasma processing operations. United States.
Smith, Jr., Michael Lane, Ward, Pamela Denise, and Stevenson, Joel O'Don. Tue . "Method & apparatus for monitoring plasma processing operations". United States. https://www.osti.gov/servlets/purl/1175081.
@article{osti_1175081,
title = {Method & apparatus for monitoring plasma processing operations},
author = {Smith, Jr., Michael Lane and Ward, Pamela Denise and Stevenson, Joel O'Don},
abstractNote = {The invention generally relates to various aspects of a plasma process and, more specifically, to the monitoring of such plasma processes. One aspect relates to a plasma monitoring module that may be adjusted in at least some manner so as to re-evaluate a previously monitored plasma process. For instance, optical emissions data on a plasma process that was previously monitored by the plasma monitoring module may be replayed through the plasma monitoring module after making at least one adjustment in relation to the plasma monitoring module.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {10}
}

Patent:

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