Discharge source with gas curtain for protecting optics from particles

Fornaciari, Neal R.; Kanouff, Michael P.

Title: Discharge source with gas curtain for protecting optics from particles

Patent · Tue Mar 30 00:00:00 EST 2004

OSTI ID:1174795

Fornaciari, Neal R.; Kanouff, Michael P.

A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.

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Research Organization:: Sandia National Lab. (SNL-CA), Livermore, CA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: AC04-94AL85000

Assignee:: EUV LLC (Santa Clara, CA)

Patent Number(s):: 6,714,624

Application Number:: 09/956,275

OSTI ID:: 1174795

Country of Publication:: United States

Language:: English

References (7)

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region Klosner, M. A.; Silfvast, W. T. Optics Letters, Vol. 23, Issue 20 https://doi.org/10.1364/OL.23.001609	journal	January 1998
Structure and low-temperature thermal conductivity of pyrolytic boron nitride Duclaux, L.; Nysten, B.; Issi, J-P. Physical Review B, Vol. 46, Issue 6 https://doi.org/10.1103/PhysRevB.46.3362	journal	August 1992
Compression Annealing of Pyrolytic Boron Nitride Moore, A. W. Nature, Vol. 221, Issue 5186 https://doi.org/10.1038/2211133a0	journal	March 1969
High-power plasma discharge source at 13.5 nm and 11.4 nm for EUV lithography Silfvast, William T.; Klosner, M.; Shimkaveg, Gregory M. Microlithography '99, SPIE Proceedings https://doi.org/10.1117/12.351098	conference	June 1999
High-power extreme-ultraviolet source based on gas jets Kubiak, Glenn D.; Bernardez II, Luis J.; Krenz, Kevin D. 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309560	conference	June 1998
Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography Mirkarimi, Paul B.; Montcalm, Claude 23rd Annual International Symposium on Microlithography, SPIE Proceedings https://doi.org/10.1117/12.309565	conference	June 1998
Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography Klosner, M. A.; Bender, H. A.; Silfvast, W. T. Optics Letters, Vol. 22, Issue 1 https://doi.org/10.1364/OL.22.000034	journal	January 1997

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