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Title: Discharge source with gas curtain for protecting optics from particles

Abstract

A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.

Inventors:
;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174795
Patent Number(s):
6,714,624
Application Number:
09/956,275
Assignee:
EUV LLC (Santa Clara, CA) OSTI
DOE Contract Number:
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS

Citation Formats

Fornaciari, Neal R., and Kanouff, Michael P.. Discharge source with gas curtain for protecting optics from particles. United States: N. p., 2004. Web.
Fornaciari, Neal R., & Kanouff, Michael P.. Discharge source with gas curtain for protecting optics from particles. United States.
Fornaciari, Neal R., and Kanouff, Michael P.. Tue . "Discharge source with gas curtain for protecting optics from particles". United States. doi:. https://www.osti.gov/servlets/purl/1174795.
@article{osti_1174795,
title = {Discharge source with gas curtain for protecting optics from particles},
author = {Fornaciari, Neal R. and Kanouff, Michael P.},
abstractNote = {A gas curtain device is employed to deflect debris that is generated by an extreme ultraviolet and soft x-ray radiation discharge source such as an electric discharge plasma source. The gas curtain device projects a stream of gas over the path of the radiation to deflect debris particles into a direction that is different from that of the path of the radiation. The gas curtain can be employed to prevent debris accumulation on the optics used in photolithography.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 30 00:00:00 EST 2004},
month = {Tue Mar 30 00:00:00 EST 2004}
}

Patent:

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