EUV mirror based absolute incident flux detector
Patent
·
OSTI ID:1174782
A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.
- Research Organization:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- EUV, LLC (Santa Clara, CA)
- Patent Number(s):
- 6,710,351
- Application Number:
- 09/956,397
- OSTI ID:
- 1174782
- Country of Publication:
- United States
- Language:
- English
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