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Title: EUV mirror based absolute incident flux detector

Abstract

A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.

Inventors:
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174782
Patent Number(s):
6,710,351
Application Number:
09/956,397
Assignee:
EUV, LLC (Santa Clara, CA) OSTI
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY

Citation Formats

Berger, Kurt W. EUV mirror based absolute incident flux detector. United States: N. p., 2004. Web.
Berger, Kurt W. EUV mirror based absolute incident flux detector. United States.
Berger, Kurt W. Tue . "EUV mirror based absolute incident flux detector". United States. https://www.osti.gov/servlets/purl/1174782.
@article{osti_1174782,
title = {EUV mirror based absolute incident flux detector},
author = {Berger, Kurt W.},
abstractNote = {A device for the in-situ monitoring of EUV radiation flux includes an integrated reflective multilayer stack. This device operates on the principle that a finite amount of in-band EUV radiation is transmitted through the entire multilayer stack. This device offers improvements over existing vacuum photo-detector devices since its calibration does not change with surface contamination.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 23 00:00:00 EST 2004},
month = {Tue Mar 23 00:00:00 EST 2004}
}

Patent:

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