Process for manufacture of semipermeable silicon nitride membranes
Patent
·
OSTI ID:1174616
A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.
- Research Organization:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 6,660,648
- Application Number:
- 09/678,418
- OSTI ID:
- 1174616
- Country of Publication:
- United States
- Language:
- English
Similar Records
Fabrication of large area gratings with sub-micron pitch using mold micromachining
Surface Micromachined Flexural Plate Wave Device Integrable on Silicon
Silicon Nitride Membranes for Filtration and Separation
Conference
·
Sat Mar 01 00:00:00 EST 1997
·
OSTI ID:1174616
+1 more
Surface Micromachined Flexural Plate Wave Device Integrable on Silicon
Technical Report
·
Fri Jan 01 00:00:00 EST 1999
·
OSTI ID:1174616
+6 more
Silicon Nitride Membranes for Filtration and Separation
Conference
·
Mon Jul 19 00:00:00 EDT 1999
·
OSTI ID:1174616
+2 more