System configured for applying multiple modifying agents to a substrate
Patent
·
OSTI ID:1174593
The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.
- Research Organization:
- Idaho National Laboratory (INL), Idaho Falls, ID (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC07-94ID13223
- Assignee:
- Bechtel BWXT Idaho, LLC (Idaho Falls, ID)
- Patent Number(s):
- 6,652,654
- Application Number:
- 09/671,459
- OSTI ID:
- 1174593
- Country of Publication:
- United States
- Language:
- English
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