1.9 kV AlGaN/GaN Lateral Schottky Barrier Diodes on Silicon
Journal Article
·
· IEEE Electron Device Letters
- Univ. of Notre Dame, IN (United States)
- Cornell Univ., Ithaca, NY (United States)
- IQE, Westborough, MA (United States)
In this letter, we present AlGaN/GaN lateral Schottky barrier diodes on silicon with recessed anodes and dual field plates. A low specific on-resistance RON,SP (5.12 mΩ · cm2), a low turn-on voltage (<0.7 V) and a high reverse breakdown voltage BV (>1.9 kV), were simultaneously achieved in devices with a 25 μm anode/cathode separation, resulting in a power figure-of-merit (FOM) BV2/RON,SP of 727 MW·cm2. The record high breakdown voltage of 1.9 kV is attributed to the dual field plate structure.
- Research Organization:
- Univ. of Notre Dame, IN (United States)
- Sponsoring Organization:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- Contributing Organization:
- Cornell University, Ithaca, NY (United States); IQE/HRL, Westborough, MA (United States)
- Grant/Contract Number:
- AR0000454
- OSTI ID:
- 1170275
- Report Number(s):
- DOE-UND-AR0000454.1; TRN: US1500478
- Journal Information:
- IEEE Electron Device Letters, Vol. 36, Issue 4; ISSN 0741-3106
- Publisher:
- IEEECopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 140 works
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