skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Composition and Interface Analysis of InGaN/GaN Multiquantum-Wells on GaN Substrates Using Atom Probe Tomography

Journal Article · · Journal of Vacuum Science and Technology B--Microelectronics and Nanometer Structures, 32(5):Article No. 051209
DOI:https://doi.org/10.1116/1.4893976· OSTI ID:1168911

In0.20Ga0.80N/GaN multi-quantum wells grown on [0001]-oriented GaN substrates with and without an InGaN buffer layer were characterized using three-dimensional atom probe tomography. In all samples, the upper interfaces of the QWs were slightly more diffuse than the lower interfaces. The buffer layers did not affect the roughness of the interfaces within the quantum well structure, a result attributed to planarization of the surface of the 1st GaN barrier layer which had an average root-mean-square roughness of 0.177 nm. The In and Ga distributions within the MQWs followed the expected distributions for a random alloy with no indications of In clustering.

Research Organization:
Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC05-76RL01830
OSTI ID:
1168911
Report Number(s):
PNNL-SA-102741; 40066; KP1704020
Journal Information:
Journal of Vacuum Science and Technology B--Microelectronics and Nanometer Structures, 32(5):Article No. 051209, Journal Name: Journal of Vacuum Science and Technology B--Microelectronics and Nanometer Structures, 32(5):Article No. 051209
Country of Publication:
United States
Language:
English

Similar Records

Optical and structural characteristics of high indium content InGaN/GaN multi-quantum wells with varying GaN cap layer thickness
Journal Article · Sat Feb 07 00:00:00 EST 2015 · Journal of Applied Physics · OSTI ID:1168911

Investigation of surface-plasmon coupled red light emitting InGaN/GaN multi-quantum well with Ag nanostructures coated on GaN surface
Journal Article · Tue Apr 21 00:00:00 EDT 2015 · Journal of Applied Physics · OSTI ID:1168911

On the increased efficiency in InGaN-based multiple quantum wells emitting at 530–590 nm with AlGaN interlayers
Journal Article · Wed Jan 07 00:00:00 EST 2015 · Journal of Crystal Growth · OSTI ID:1168911