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Title: Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function

Authors:
; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Energy Frontier Research Centers (EFRC); Center for Excitonics (CE)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1167836
DOE Contract Number:  
SC0001088
Resource Type:
Journal Article
Resource Relation:
Journal Name: Nano Lett.; Journal Volume: 14; Related Information: CE partners with Massachusetts Institute of Technology (lead); Brookhaven National Laboratory; Harvard University
Country of Publication:
United States
Language:
English
Subject:
solar (photovoltaic), solid state lighting, photosynthesis (natural and artificial), charge transport, optics, synthesis (novel materials), synthesis (self-assembly), synthesis (scalable processing)

Citation Formats

Manfrinato, Vitor R., Wen, Jianguo, Zhang, Lihua, Yang, Yujia, Hobbs, Richard G., Baker, Bowen, Su, Dong, Zakharov, Dmitri, Zaluzec, Nestor J., Miller, Dean J., Stach, Eric A., and Berggren, Karl K.. Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function. United States: N. p., 2014. Web. doi:10.1021/nl5013773.
Manfrinato, Vitor R., Wen, Jianguo, Zhang, Lihua, Yang, Yujia, Hobbs, Richard G., Baker, Bowen, Su, Dong, Zakharov, Dmitri, Zaluzec, Nestor J., Miller, Dean J., Stach, Eric A., & Berggren, Karl K.. Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function. United States. doi:10.1021/nl5013773.
Manfrinato, Vitor R., Wen, Jianguo, Zhang, Lihua, Yang, Yujia, Hobbs, Richard G., Baker, Bowen, Su, Dong, Zakharov, Dmitri, Zaluzec, Nestor J., Miller, Dean J., Stach, Eric A., and Berggren, Karl K.. Wed . "Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function". United States. doi:10.1021/nl5013773.
@article{osti_1167836,
title = {Determining the Resolution Limits of Electron-Beam Lithography: Direct Measurement of the Point-Spread Function},
author = {Manfrinato, Vitor R. and Wen, Jianguo and Zhang, Lihua and Yang, Yujia and Hobbs, Richard G. and Baker, Bowen and Su, Dong and Zakharov, Dmitri and Zaluzec, Nestor J. and Miller, Dean J. and Stach, Eric A. and Berggren, Karl K.},
abstractNote = {},
doi = {10.1021/nl5013773},
journal = {Nano Lett.},
number = ,
volume = 14,
place = {United States},
year = {Wed Aug 13 00:00:00 EDT 2014},
month = {Wed Aug 13 00:00:00 EDT 2014}
}