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Title: Apparatus and process for passivating an SRF cavity

Abstract

An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field. Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided.

Inventors:
;
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1164667
Patent Number(s):
8,903,464
Application Number:
12/925,503
Assignee:
Jefferson Science Associates, LLC (Newport News, VA) ORO
DOE Contract Number:  
AC05-06OR23177
Resource Type:
Patent
Resource Relation:
Patent File Date: 2010 Oct 23
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; 36 MATERIALS SCIENCE

Citation Formats

Myneni, Ganapati Rao, and Wallace, John P. Apparatus and process for passivating an SRF cavity. United States: N. p., 2014. Web.
Myneni, Ganapati Rao, & Wallace, John P. Apparatus and process for passivating an SRF cavity. United States.
Myneni, Ganapati Rao, and Wallace, John P. Tue . "Apparatus and process for passivating an SRF cavity". United States. https://www.osti.gov/servlets/purl/1164667.
@article{osti_1164667,
title = {Apparatus and process for passivating an SRF cavity},
author = {Myneni, Ganapati Rao and Wallace, John P},
abstractNote = {An apparatus and process for the production of a niobium cavity exhibiting high quality factors at high gradients is provided. The apparatus comprises a first chamber positioned within a second chamber, an RF generator and vacuum pumping systems. The process comprises placing the niobium cavity in a first chamber of the apparatus; thermally treating the cavity by high temperature in the first chamber while maintaining high vacuum in the first and second chambers; and applying a passivating thin film layer to a surface of the cavity in the presence of a gaseous mixture and an RF field. Further a niobium cavity exhibiting high quality factors at high gradients produced by the method of the invention is provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {12}
}

Patent:

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