The SEMATECH high-NA actinic reticle review project (SHARP) EUV mask-imaging microscope

Journal Article · Mon Sep 02 00:00:00 EDT 2013 · Proc. SPIE

DOI:https://doi.org/10.1117/12.2026496· OSTI ID:1164382

Goldberg, Kenneth A.; Mochi, Iacopo; Benk, Markus P.; Lin, Chihcheng; Allezy, Arnaud; Dickinson, Michael; Cork, Carl W.; Macdougall, James B.; Anderson, Erik H.; Chao, Weilun; Salmassi, Farhad; Gullikson, Eric. M.; Zehm, Daniel; Vytla, Vamsi; Cork, William; DePonte, Jason; Picchi, Gino; Pekedis, Ahmet; Katayanagi, Takeshi; Jones, Michael G. ; Martin, Elizabeth; Naulleau, Patrick P.; Rekawa, Senajith B.

• Research Organization: Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: DE-AC02-05CH11231
• OSTI ID: 1164382
• Report Number(s): LBNL-6517E
• Journal Information: Proc. SPIE, Vol. 8880; Related Information: Journal Publication Date: Sept. 2013
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE