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Title: Ion beam sputter target and method of manufacture

Abstract

A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.

Inventors:
; ; ; ; ; ;
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1156819
Patent Number(s):
8,821,701
Application Number:
12/792,324
Assignee:
GFO
DOE Contract Number:
FG36-06GO1605
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY

Citation Formats

Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, and Milner, Robert. Ion beam sputter target and method of manufacture. United States: N. p., 2014. Web.
Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, & Milner, Robert. Ion beam sputter target and method of manufacture. United States.
Higdon, Clifton, Elmoursi, Alaa A., Goldsmith, Jason, Cook, Bruce, Blau, Peter, Jun, Qu, and Milner, Robert. Tue . "Ion beam sputter target and method of manufacture". United States. doi:. https://www.osti.gov/servlets/purl/1156819.
@article{osti_1156819,
title = {Ion beam sputter target and method of manufacture},
author = {Higdon, Clifton and Elmoursi, Alaa A. and Goldsmith, Jason and Cook, Bruce and Blau, Peter and Jun, Qu and Milner, Robert},
abstractNote = {A target for use in an ion beam sputtering apparatus made of at least two target tiles where at least two of the target tiles are made of different chemical compositions and are mounted on a main tile and geometrically arranged on the main tile to yield a desired chemical composition on a sputtered substrate. In an alternate embodiment, the tiles are of varied thickness according to the desired chemical properties of the sputtered film. In yet another alternate embodiment, the target is comprised of plugs pressed in a green state which are disposed in cavities formed in a main tile also formed in a green state and the assembly can then be compacted and then sintered.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Sep 02 00:00:00 EDT 2014},
month = {Tue Sep 02 00:00:00 EDT 2014}
}

Patent:

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