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Title: Copper-assisted, anti-reflection etching of silicon surfaces

Abstract

A method (300) for etching a silicon surface (116) to reduce reflectivity. The method (300) includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (116), with a particle-to-particle spacing of 3 to 8 nanometers. The method (300) includes positioning (310) the substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface (116) is etched (350) by agitating the etching solution (124) with, for example, ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, copper nanoparticles enhance or drive the etching process.

Inventors:
;
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1151783
Patent Number(s):
8,815,104
Application Number:
13/423,745
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO) NREL
DOE Contract Number:  
AC36-08GO28308
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Toor, Fatima, and Branz, Howard. Copper-assisted, anti-reflection etching of silicon surfaces. United States: N. p., 2014. Web.
Toor, Fatima, & Branz, Howard. Copper-assisted, anti-reflection etching of silicon surfaces. United States.
Toor, Fatima, and Branz, Howard. Tue . "Copper-assisted, anti-reflection etching of silicon surfaces". United States. doi:. https://www.osti.gov/servlets/purl/1151783.
@article{osti_1151783,
title = {Copper-assisted, anti-reflection etching of silicon surfaces},
author = {Toor, Fatima and Branz, Howard},
abstractNote = {A method (300) for etching a silicon surface (116) to reduce reflectivity. The method (300) includes electroless deposition of copper nanoparticles about 20 nanometers in size on the silicon surface (116), with a particle-to-particle spacing of 3 to 8 nanometers. The method (300) includes positioning (310) the substrate (112) with a silicon surface (116) into a vessel (122). The vessel (122) is filled (340) with a volume of an etching solution (124) so as to cover the silicon surface (116). The etching solution (124) includes an oxidant-etchant solution (146), e.g., an aqueous solution of hydrofluoric acid and hydrogen peroxide. The silicon surface (116) is etched (350) by agitating the etching solution (124) with, for example, ultrasonic agitation, and the etching may include heating (360) the etching solution (124) and directing light (365) onto the silicon surface (116). During the etching, copper nanoparticles enhance or drive the etching process.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 26 00:00:00 EDT 2014},
month = {Tue Aug 26 00:00:00 EDT 2014}
}

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