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Title: Optical cavity furnace for semiconductor wafer processing

Abstract

An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.

Inventors:
Publication Date:
Research Org.:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1150004
Patent Number(s):
8,796,160
Application Number:
12/919,433
Assignee:
Alliance for Sustainable Energy, LLC (Golden, CO)
DOE Contract Number:  
AC36-08G028308
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Sopori, Bhushan L. Optical cavity furnace for semiconductor wafer processing. United States: N. p., 2014. Web.
Sopori, Bhushan L. Optical cavity furnace for semiconductor wafer processing. United States.
Sopori, Bhushan L. Tue . "Optical cavity furnace for semiconductor wafer processing". United States. https://www.osti.gov/servlets/purl/1150004.
@article{osti_1150004,
title = {Optical cavity furnace for semiconductor wafer processing},
author = {Sopori, Bhushan L.},
abstractNote = {An optical cavity furnace 10 having multiple optical energy sources 12 associated with an optical cavity 18 of the furnace. The multiple optical energy sources 12 may be lamps or other devices suitable for producing an appropriate level of optical energy. The optical cavity furnace 10 may also include one or more reflectors 14 and one or more walls 16 associated with the optical energy sources 12 such that the reflectors 14 and walls 16 define the optical cavity 18. The walls 16 may have any desired configuration or shape to enhance operation of the furnace as an optical cavity 18. The optical energy sources 12 may be positioned at any location with respect to the reflectors 14 and walls defining the optical cavity. The optical cavity furnace 10 may further include a semiconductor wafer transport system 22 for transporting one or more semiconductor wafers 20 through the optical cavity.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {8}
}

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Works referenced in this record:

High-flux solar furnace processing of silicon solar cells
conference, January 1994

  • Tsuo, Y. S.; Pitts, J. R.; Landry, M. D.
  • Proceedings of 1994 IEEE 1st World Conference on Photovoltaic Energy Conversion - WCPEC (A Joint Conference of PVSC, PVSEC and PSEC)
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A high throughput, noncontact system for screening silicon wafers predisposed to breakage during solar cell production
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  • Sopori, Bhushan; Rupnowski, Przemyslaw; Basnyat, Prakash
  • 2011 37th IEEE Photovoltaic Specialists Conference (PVSC)
  • DOI: 10.1109/PVSC.2011.6186153

Graphic script provides quick classification of GaAs wafers
journal, March 2000


Non-destructive optical methods for assessing defects in production of Si or SiGe materials
journal, July 2004

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  • DOI: 10.1051/epjap:2004075