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Title: Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

Authors:
; ; ;  [1]
  1. (UMM)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
DOE - BASIC ENERGY SCIENCESINDUSTRY
OSTI Identifier:
1149627
Resource Type:
Journal Article
Resource Relation:
Journal Name: Macromolecules; Journal Volume: 47; Journal Issue: (4) ; 02, 2014
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Kennemur, Justin G., Yao, Li, Bates, Frank S., and Hillmyer, Marc A. Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography. United States: N. p., 2014. Web. doi:10.1021/ma4020164.
Kennemur, Justin G., Yao, Li, Bates, Frank S., & Hillmyer, Marc A. Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography. United States. doi:10.1021/ma4020164.
Kennemur, Justin G., Yao, Li, Bates, Frank S., and Hillmyer, Marc A. Thu . "Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography". United States. doi:10.1021/ma4020164.
@article{osti_1149627,
title = {Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography},
author = {Kennemur, Justin G. and Yao, Li and Bates, Frank S. and Hillmyer, Marc A.},
abstractNote = {},
doi = {10.1021/ma4020164},
journal = {Macromolecules},
number = (4) ; 02, 2014,
volume = 47,
place = {United States},
year = {Thu Aug 07 00:00:00 EDT 2014},
month = {Thu Aug 07 00:00:00 EDT 2014}
}