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Title: Photosensitive Polysilane Thin Films for Write-As-Needed Optical Devices.

Abstract

Abstract not provided.

Authors:
; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1148071
Report Number(s):
SAND2007-3843J
522490
DOE Contract Number:
DE-AC04-94AL85000
Resource Type:
Journal Article
Resource Relation:
Journal Name: Proceedings of SPIE-The International Society for Optical Engineering; Related Information: Proposed for publication in Proceedings of SPIE-The International Society for Optical Engineering.
Country of Publication:
United States
Language:
English

Citation Formats

Jamison, Gregory M., Simmons-Potter, K., and Potter, Jr., B. G. Photosensitive Polysilane Thin Films for Write-As-Needed Optical Devices.. United States: N. p., 2007. Web.
Jamison, Gregory M., Simmons-Potter, K., & Potter, Jr., B. G. Photosensitive Polysilane Thin Films for Write-As-Needed Optical Devices.. United States.
Jamison, Gregory M., Simmons-Potter, K., and Potter, Jr., B. G. Fri . "Photosensitive Polysilane Thin Films for Write-As-Needed Optical Devices.". United States. doi:.
@article{osti_1148071,
title = {Photosensitive Polysilane Thin Films for Write-As-Needed Optical Devices.},
author = {Jamison, Gregory M. and Simmons-Potter, K. and Potter, Jr., B. G.},
abstractNote = {Abstract not provided.},
doi = {},
journal = {Proceedings of SPIE-The International Society for Optical Engineering},
number = ,
volume = ,
place = {United States},
year = {Fri Jun 01 00:00:00 EDT 2007},
month = {Fri Jun 01 00:00:00 EDT 2007}
}
  • Abstract not provided.
  • Abstract not provided.
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  • Agile ready-when-needed patterning of refractive index structures in photosensitive materials requires an understanding of the impact of local application environment on mechanisms contributing to the desired photoinduced index change. The present work examines the impact of atmosphere on the photosensitive response of poly(methylphenylsilane) (PMPS) thin films whose high photoinduced index change under low incident optical fluence make them attractive candidates for such applications. Changes in optical absorption and refractive index are investigated after exposure to ultraviolet (UV) light resonant with the lowest energy transition exhibited by the Si-Si backbone structure in the material. A comparison between photoinduced absorption changes formore » thin films exposed in an air atmosphere versus those observed for samples subjected to a nitrogen environment during photoexposure is made for the first time. The study reveals that the anaerobic conditions of the nitrogen atmosphere significantly reduce the photosensitive response of the material to light. These results are discussed in terms of photooxidation processes within the polysilane structure and in the context of the need for predictable photosensitive refractive index change in varied photoimprinting environments.« less