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Title: Plasmon absorption modulator systems and methods

Abstract

Plasmon absorption modulator systems and methods are disclosed. A plasmon absorption modulator system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and a metal layer formed on a top surface of the stack of quantum well layers. A method for modulating plasmonic current includes enabling propagation of the plasmonic current along a metal layer, and applying a voltage across the stack of quantum well layers to cause absorption of a portion of energy of the plasmonic current by the stack of quantum well layers. A metamaterial switching system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and at least one metamaterial structure formed on a top surface of the stack of quantum well layers.

Inventors:
;
Publication Date:
Research Org.:
SNL (Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States))
Sponsoring Org.:
USDOE
OSTI Identifier:
1143679
Patent Number(s):
8,780,431
Application Number:
13/364,832
Assignee:
Sandia Corporation (Albuquerque, NM) SNL
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING

Citation Formats

Kekatpure, Rohan Deodatta, and Davids, Paul. Plasmon absorption modulator systems and methods. United States: N. p., 2014. Web.
Kekatpure, Rohan Deodatta, & Davids, Paul. Plasmon absorption modulator systems and methods. United States.
Kekatpure, Rohan Deodatta, and Davids, Paul. Tue . "Plasmon absorption modulator systems and methods". United States. doi:. https://www.osti.gov/servlets/purl/1143679.
@article{osti_1143679,
title = {Plasmon absorption modulator systems and methods},
author = {Kekatpure, Rohan Deodatta and Davids, Paul},
abstractNote = {Plasmon absorption modulator systems and methods are disclosed. A plasmon absorption modulator system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and a metal layer formed on a top surface of the stack of quantum well layers. A method for modulating plasmonic current includes enabling propagation of the plasmonic current along a metal layer, and applying a voltage across the stack of quantum well layers to cause absorption of a portion of energy of the plasmonic current by the stack of quantum well layers. A metamaterial switching system includes a semiconductor substrate, a plurality of quantum well layers stacked on a top surface of the semiconductor substrate, and at least one metamaterial structure formed on a top surface of the stack of quantum well layers.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jul 15 00:00:00 EDT 2014},
month = {Tue Jul 15 00:00:00 EDT 2014}
}

Patent:

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Works referenced in this record:

Plasmonics: the next chip-scale technology
journal, July 2006


Plasmonics beyond the diffraction limit
journal, January 2010

  • Gramotnev, Dmitri K.; Bozhevolnyi, Sergey I.
  • Nature Photonics, Vol. 4, Issue 2, p. 83-91
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