Reduced Interaction Layer Growth of U-Mo Dispersion in Al-Si

Journal Article · Thu Nov 01 00:00:00 EDT 2012 · Journal of Nuclear Materials

DOI:https://doi.org/10.1016/j.jnucmat.2012.06.032· OSTI ID:1132752

Kim, Y. S.; Park, J. M.; Ryu, H. J.; Hofman, G. L. ^[1]

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1. Nuclear Engineering Division

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: DE-AC02-06CH11357
• OSTI ID: 1132752
• Report Number(s): ANL/NE/JA-73333
• Journal Information: Journal of Nuclear Materials, Vol. 430, Issue 1-3 ; Nov. 2012
• Country of Publication: United States
• Language: ENGLISH