Electroplate and Lift Lithography for Patterned Micro/Nanowires Using Ultrananocrystalline Diamond (UNCD) as a Reusable Template

Seley, David B.; Dissing, Daniel A.; Sumant, Anirudha V.; Divan, Ralu; Miller, Suzanne; Auciello, Orlando; Lepak, Lori A.; Terrell, Eric A.; Shogren, Tyler J.; Fahrner, Daryl A.; Hamilton, James P.; Zach, Michael P.

doi:10.1021/am101226w

Title: Electroplate and Lift Lithography for Patterned Micro/Nanowires Using Ultrananocrystalline Diamond (UNCD) as a Reusable Template

Journal Article · Mon Mar 21 00:00:00 EDT 2011 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/am101226w· OSTI ID:1123350

Seley, David B. ^[1]; Dissing, Daniel A. ^[1]; Sumant, Anirudha V. ^[2]; Divan, Ralu ^[2]; Miller, Suzanne ^[2]; Auciello, Orlando ^[3]; Lepak, Lori A. ^[1]; Terrell, Eric A. ^[1]; Shogren, Tyler J. ^[1]; Fahrner, Daryl A. ^[1]; Hamilton, James P. ^[4]; Zach, Michael P. ^[1]

Department of Chemistry, University of Wisconsin−Stevens Point, Stevens Point, Wisconsin 54481, United States
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States
Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, United States, Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, United States
Department of Chemistry and Engineering Physics and Nanotechnology Center for Collaborative R&D [NCCRD], University of Wisconsin−Platteville, Platteville, Wisconsin 53818, United States

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Sponsoring Organization:: USDOE

OSTI ID:: 1123350

Journal Information:: ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Vol. 3 Journal Issue: 4; ISSN 1944-8244

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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