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Title: Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.

Abstract

Abstract not provided.

Authors:
; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Laboratories, Livermore, CA
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1120202
Report Number(s):
SAND2011-7429C
482190
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the NINE meeting held July 26, 2011 in Albuquerque, NM.
Country of Publication:
United States
Language:
English

Citation Formats

Brennecka, Geoffrey L., George, Matthew C, Burckel, David Bruce, Skinner, Jack L., Yang, Chu-Yeu Peter, Steinhaus, Charles A., Allendorf, Sarah W., Brueck, Steven R.J., Raub, Alex, Nealey, Paul F., de Pablo, Juan J., Williamson, Lance, and Peters, Brandon L. Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.. United States: N. p., 2011. Web.
Brennecka, Geoffrey L., George, Matthew C, Burckel, David Bruce, Skinner, Jack L., Yang, Chu-Yeu Peter, Steinhaus, Charles A., Allendorf, Sarah W., Brueck, Steven R.J., Raub, Alex, Nealey, Paul F., de Pablo, Juan J., Williamson, Lance, & Peters, Brandon L. Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.. United States.
Brennecka, Geoffrey L., George, Matthew C, Burckel, David Bruce, Skinner, Jack L., Yang, Chu-Yeu Peter, Steinhaus, Charles A., Allendorf, Sarah W., Brueck, Steven R.J., Raub, Alex, Nealey, Paul F., de Pablo, Juan J., Williamson, Lance, and Peters, Brandon L. Sat . "Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.". United States. https://www.osti.gov/servlets/purl/1120202.
@article{osti_1120202,
title = {Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.},
author = {Brennecka, Geoffrey L. and George, Matthew C and Burckel, David Bruce and Skinner, Jack L. and Yang, Chu-Yeu Peter and Steinhaus, Charles A. and Allendorf, Sarah W. and Brueck, Steven R.J. and Raub, Alex and Nealey, Paul F. and de Pablo, Juan J. and Williamson, Lance and Peters, Brandon L.},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2011},
month = {10}
}

Conference:
Other availability
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