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Title: Solution deposition assembly

Abstract

Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.

Inventors:
; ; ; ;
Publication Date:
Research Org.:
Nanosolar, Inc., San Jose, CA, USA
Sponsoring Org.:
USDOE
OSTI Identifier:
1117858
Patent Number(s):
8,631,757
Application Number:
12/369,524
Assignee:
Nanosolar, Inc. (San Jose, CA) GFO
DOE Contract Number:  
FC36-07GO17047
Resource Type:
Patent
Resource Relation:
Patent File Date: 2009 Feb 11
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY

Citation Formats

Roussillon, Yann, Scholz, Jeremy H, Shelton, Addison, Green, Geoff T, and Utthachoo, Piyaphant. Solution deposition assembly. United States: N. p., 2014. Web.
Roussillon, Yann, Scholz, Jeremy H, Shelton, Addison, Green, Geoff T, & Utthachoo, Piyaphant. Solution deposition assembly. United States.
Roussillon, Yann, Scholz, Jeremy H, Shelton, Addison, Green, Geoff T, and Utthachoo, Piyaphant. Tue . "Solution deposition assembly". United States. https://www.osti.gov/servlets/purl/1117858.
@article{osti_1117858,
title = {Solution deposition assembly},
author = {Roussillon, Yann and Scholz, Jeremy H and Shelton, Addison and Green, Geoff T and Utthachoo, Piyaphant},
abstractNote = {Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber, at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {1}
}

Patent:

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