Growth of ultrathin amorphous alumina films during the oxidation of NiAl(100)
Journal Article
·
· Surface Science
OSTI ID:1117491
- Research Organization:
- Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials (CFN)
- Sponsoring Organization:
- National Science Foundation (NSF)
- DOE Contract Number:
- DE-AC02-98CH10886
- OSTI ID:
- 1117491
- Report Number(s):
- BNL-103727-2014-JA; KC0403020
- Journal Information:
- Surface Science, Vol. 618
- Country of Publication:
- United States
- Language:
- English
Similar Records
The Crystallization of Amorphous Aluminum Oxide Thin Films Grown on NiAl(100)
Effect of Oxygen Gas Pressure on the Kinetics of Alumina Film Growth During the Oxidation of Al(111) at Room Temperature
Ba Deposition and Oxidation on θ-Al2O3/NiAl(100) ultrathin films. Part II: O2(g) assisted Ba oxidation
Journal Article
·
Mon Sep 01 00:00:00 EDT 2014
· Journal of the American Ceramic Society
·
OSTI ID:1117491
Effect of Oxygen Gas Pressure on the Kinetics of Alumina Film Growth During the Oxidation of Al(111) at Room Temperature
Journal Article
·
Thu Sep 29 00:00:00 EDT 2011
· Physical Review. B, Condensed Matter and Materials Physics
·
OSTI ID:1117491
+1 more
Ba Deposition and Oxidation on θ-Al2O3/NiAl(100) ultrathin films. Part II: O2(g) assisted Ba oxidation
Journal Article
·
Thu Aug 31 00:00:00 EDT 2006
· Journal of Physical Chemistry B, 110(34):17009-17014
·
OSTI ID:1117491