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Title: Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.

Abstract

Abstract not provided.

Authors:
; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1116450
Report Number(s):
SAND2012-8371C
480455
DOE Contract Number:
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the Electrochemical Society Meeting held October 7-12, 2012 in Honolulu, HI.
Country of Publication:
United States
Language:
English

Citation Formats

Douglas, Erica Ann, Stevens, Jeffrey, Shul, Randy John, and Pearton, S. J. Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.. United States: N. p., 2012. Web.
Douglas, Erica Ann, Stevens, Jeffrey, Shul, Randy John, & Pearton, S. J. Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.. United States.
Douglas, Erica Ann, Stevens, Jeffrey, Shul, Randy John, and Pearton, S. J. Mon . "Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.". United States. doi:. https://www.osti.gov/servlets/purl/1116450.
@article{osti_1116450,
title = {Inductively Coupled Plasma Etching of InP with Cl2/H2/Ar Plasma.},
author = {Douglas, Erica Ann and Stevens, Jeffrey and Shul, Randy John and Pearton, S. J.},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Oct 01 00:00:00 EDT 2012},
month = {Mon Oct 01 00:00:00 EDT 2012}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

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