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Title: Atomic and Electronic Structure of Polar Oxide Interfaces

Abstract

In this project we developed fundamental understanding of atomic and electronic mechanisms for stabilization of polar oxide interfaces. An integrated experimental and theoretical methodology was used to develop knowledge on this important new class of ionic materials with limited dimensionality, with implications for multiple branches of the basic and applied energy sciences.

Authors:
 [1]
  1. University of Wisconsin Milwaukee
Publication Date:
Research Org.:
University of Wisconsin - Milwaukee, Milwaukee, WI
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1115004
Report Number(s):
DOE_UWM_MGJ_FG02-06ER46328
DOE Contract Number:
FG02-06ER46328
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; Polar oxide surfaces and interfaces

Citation Formats

Gajdardziska-Josifovska, Marija. Atomic and Electronic Structure of Polar Oxide Interfaces. United States: N. p., 2014. Web. doi:10.2172/1115004.
Gajdardziska-Josifovska, Marija. Atomic and Electronic Structure of Polar Oxide Interfaces. United States. doi:10.2172/1115004.
Gajdardziska-Josifovska, Marija. Fri . "Atomic and Electronic Structure of Polar Oxide Interfaces". United States. doi:10.2172/1115004. https://www.osti.gov/servlets/purl/1115004.
@article{osti_1115004,
title = {Atomic and Electronic Structure of Polar Oxide Interfaces},
author = {Gajdardziska-Josifovska, Marija},
abstractNote = {In this project we developed fundamental understanding of atomic and electronic mechanisms for stabilization of polar oxide interfaces. An integrated experimental and theoretical methodology was used to develop knowledge on this important new class of ionic materials with limited dimensionality, with implications for multiple branches of the basic and applied energy sciences.},
doi = {10.2172/1115004},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Fri Jan 17 00:00:00 EST 2014},
month = {Fri Jan 17 00:00:00 EST 2014}
}

Technical Report:

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  • A next-generation experimental end station for surface and interface science studies has been developed with the aim of making full utilization of the capabilities of a third generation synchrotron radiation facility such as the Advanced Light Source. This system, the Advanced Photoelectron Spectrometer/Diffractrometer (APSD), has initially been installed on one half of the rotating platform on the bending magnet beamline 9.3.2 and is planned to be moved to the Elliptical Polarized Undulator (EPU) beamline 4.0.1 in the latter part of 1997. The first phase of the APSD system is completely commissioned and it has been routinely used by both themore » PRT and independent investigators since November, 1994, for numerous studies, as discussed in a number of other reports in this compendium. The following is a brief description of the important characteristics of this experimental end station as it now stands, together with the various improvements and additions for enhancing its capabilities that are either underway or planned.« less
  • Materials containing ceramic and metal phases play a significant role in modern materials technology.
  • This project focused on three different aspects of oxide thin film systems: (1) Model metal/oxide and oxide/oxide interface studies were carried out by depositing ultra-thin metal (Al, K, Mg) and oxide (MgO, AlO{sub x}) films on TiO{sub 2}, NiO and {alpha}-Al{sub 2}O{sub 3} single crystal oxide substrates. (2) Electron cyclotron resonance (ECR) oxygen plasma deposition was used to fabricate AlO{sub 3} and ZrO{sub 2} films on sapphire substrates, and film growth mechanisms and structural characteristics were investigated. (3) The friction and wear characteristics of ZrO{sub 2} films on sapphire substrates in unlubricated sliding contact were studied and correlated with filmmore » microstructure. In these studies, thin film and interfacial regions were characterized using diffraction (RHEED, LEED, XRD), electron spectroscopies (XPS, UPS, AES), microscopy (AFM) and tribology instruments (pin-on-disk, friction microprobe, and scratch tester). By precise control of thin film microstructure, an increased understanding of the structural and chemical stability of interface regions and tribological performance of ultra-thin oxide films was achieved in these important ceramic systems.« less
  • Cited by 5
  • Studies of structural, electronic, and chemical properties of metal/oxide and oxide/oxide interfaces were performed on well-defined interfaces that created by depositing ultra-thin potassium and aluminum films and their oxides onto single crystal TiO[sub 2] and NiO surfaces. Work focused on determining the structure, growth mechanisms, and morphologies of metal and oxide films as they are deposited an single crystal oxide surfaces using RHEED and atomic force microscopy probing electronic structure, bonding and chemical interactions at the interfaces using x-ray and uv photoelectron spectroscopies (XPS, UPS) and Auger electron spectroscopy (AES), and understanding factors affecting stability and reactivity of the interfacemore » regions including the role of defects and impurities. Results indicate that kinetic effects have an important influence on interface structure and composition, and they also show that defects in the oxide substrate induce new electronic states at the interface which play a major role in cation-anion bonding and interface interactions. The results establish a link between electronic and chemical bonding properties and the interface structure and morphology, which is required to successfully manipulate the interfacial properties of advanced ceramic materials.« less