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Title: Characterization of Nanoscale hcp Phase Nickel in a fcc Phase Nickel Thin Film.

Abstract

Abstract not provided.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1113084
Report Number(s):
SAND2011-8046C
457123
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the Materials Science and Technology 2011 Conference and Exhibition held October 17-21, 2011 in Columbus, OH.
Country of Publication:
United States
Language:
English

Citation Formats

Hattar, Khalid Mikhiel, Knapp, James Arthur, Rajasekhara, Shreyas, Kaweswaran Ganesh, and Paulo Ferreira. Characterization of Nanoscale hcp Phase Nickel in a fcc Phase Nickel Thin Film.. United States: N. p., 2011. Web.
Hattar, Khalid Mikhiel, Knapp, James Arthur, Rajasekhara, Shreyas, Kaweswaran Ganesh, & Paulo Ferreira. Characterization of Nanoscale hcp Phase Nickel in a fcc Phase Nickel Thin Film.. United States.
Hattar, Khalid Mikhiel, Knapp, James Arthur, Rajasekhara, Shreyas, Kaweswaran Ganesh, and Paulo Ferreira. Sat . "Characterization of Nanoscale hcp Phase Nickel in a fcc Phase Nickel Thin Film.". United States. https://www.osti.gov/servlets/purl/1113084.
@article{osti_1113084,
title = {Characterization of Nanoscale hcp Phase Nickel in a fcc Phase Nickel Thin Film.},
author = {Hattar, Khalid Mikhiel and Knapp, James Arthur and Rajasekhara, Shreyas and Kaweswaran Ganesh and Paulo Ferreira},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2011},
month = {10}
}

Conference:
Other availability
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