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Title: Addressable morphology control of silica structures by manipulating the reagent addition time

Authors:
 [1];  [1];  [1]
  1. ORNL
Publication Date:
Research Org.:
Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Center for Nanophase Materials Sciences (CNMS)
Sponsoring Org.:
USDOE Laboratory Directed Research and Development (LDRD) Program
OSTI Identifier:
1110986
DOE Contract Number:
DE-AC05-00OR22725
Resource Type:
Journal Article
Resource Relation:
Journal Name: RSC Advances; Journal Volume: 4; Journal Issue: 5
Country of Publication:
United States
Language:
English
Subject:
silica; addressable; control

Citation Formats

Sharma, Jaswinder K, Datskos, Panos G, and Chen, Jihua. Addressable morphology control of silica structures by manipulating the reagent addition time. United States: N. p., 2014. Web.
Sharma, Jaswinder K, Datskos, Panos G, & Chen, Jihua. Addressable morphology control of silica structures by manipulating the reagent addition time. United States.
Sharma, Jaswinder K, Datskos, Panos G, and Chen, Jihua. Wed . "Addressable morphology control of silica structures by manipulating the reagent addition time". United States. doi:.
@article{osti_1110986,
title = {Addressable morphology control of silica structures by manipulating the reagent addition time},
author = {Sharma, Jaswinder K and Datskos, Panos G and Chen, Jihua},
abstractNote = {},
doi = {},
journal = {RSC Advances},
number = 5,
volume = 4,
place = {United States},
year = {Wed Jan 01 00:00:00 EST 2014},
month = {Wed Jan 01 00:00:00 EST 2014}
}