Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus
Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC02-05CH11231
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Number(s):
- 8,580,130
- Application Number:
- 12/743,550
- OSTI ID:
- 1108010
- Country of Publication:
- United States
- Language:
- English
Method of producing compound nanorods and thin films
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patent | August 2010 |
Room-Temperature Ultraviolet Nanowire Nanolasers
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journal | June 2001 |
Nanolasers: lasing from nanoscale quantum wires
|
journal | January 2004 |
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