Multilayer infrared metamaterial fabrication using membrane projection lithography

Journal Article · Tue Nov 01 00:00:00 EDT 2011 · Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics

DOI:https://doi.org/10.1116/1.3653258· OSTI ID:1107194

Bruce Burckel, D.; Wendt, Joel R.; Samora, Sally; Sinclair, Michael B.; Brener, Igal; Ginn, James C.

Membrane projection lithography is extended from a single layer fabrication technique to a multilayer process, adding polymeric backfill and planarization after each layer is completed. Unaligned contact lithography is used as a rapid prototyping tool to aid in process development, patterning resist membranes in seconds without requiring long e-beam write times. The fabricated multilayer structures show good resistance to solvent attack from subsequent process steps and demonstrate in-plane and out of plane multilayer metallic inclusions in a dielectric host, which is a critical step in the path to develop bulklike metamaterials at optical frequencies.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• DOE Contract Number: AC04-94AL85000
• OSTI ID: 1107194
• Report Number(s): SAND2011-4380J; 465772
• Journal Information: Journal of Vacuum Science and Technology. B, Nanotechnology and Microelectronics, Vol. 29, Issue 6; Related Information: Proposed for publication in Journal of Vacuum Science and Technology B.; ISSN 2166-2746
• Publisher: American Vacuum Society/AIP
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY