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Title: Dislocation-Interface Interactions in Silicon.

Abstract

Abstract not provided.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-CA), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1106399
Report Number(s):
SAND2011-5577C
464145
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the LAMMPS users' conference held August 9-11, 2011 in Albuquerque, NM.
Country of Publication:
United States
Language:
English

Citation Formats

Hale, Lucas Michael, Zimmerman, Jonathan A., Zhou, Xiao Wang, Moody, Neville Reid, Gerberich, William, and Ballarini, Roberto. Dislocation-Interface Interactions in Silicon.. United States: N. p., 2011. Web.
Hale, Lucas Michael, Zimmerman, Jonathan A., Zhou, Xiao Wang, Moody, Neville Reid, Gerberich, William, & Ballarini, Roberto. Dislocation-Interface Interactions in Silicon.. United States.
Hale, Lucas Michael, Zimmerman, Jonathan A., Zhou, Xiao Wang, Moody, Neville Reid, Gerberich, William, and Ballarini, Roberto. Mon . "Dislocation-Interface Interactions in Silicon.". United States. https://www.osti.gov/servlets/purl/1106399.
@article{osti_1106399,
title = {Dislocation-Interface Interactions in Silicon.},
author = {Hale, Lucas Michael and Zimmerman, Jonathan A. and Zhou, Xiao Wang and Moody, Neville Reid and Gerberich, William and Ballarini, Roberto},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2011},
month = {8}
}

Conference:
Other availability
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