Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature
Journal Article
·
· Physical Review B
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1100862
- Journal Information:
- Physical Review B, Vol. 84, Issue 12; ISSN 1098-0121
- Publisher:
- American Physical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 47 works
Citation information provided by
Web of Science
Web of Science
Similar Records
Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature
Effect of Oxygen Gas Pressure on the Kinetics of Alumina Film Growth During the Oxidation of Al(111) at Room Temperature
Tuning the Limiting Thickness of a Thin Oxide Layer on Al (111) with Oxygen Gas Pressure
Journal Article
·
Thu Sep 15 00:00:00 EDT 2011
· Physical Review. B, Condensed Matter and Materials Physics
·
OSTI ID:1100862
+1 more
Effect of Oxygen Gas Pressure on the Kinetics of Alumina Film Growth During the Oxidation of Al(111) at Room Temperature
Journal Article
·
Thu Sep 29 00:00:00 EDT 2011
· Physical Review. B, Condensed Matter and Materials Physics
·
OSTI ID:1100862
+1 more
Tuning the Limiting Thickness of a Thin Oxide Layer on Al (111) with Oxygen Gas Pressure
Journal Article
·
Mon Jul 11 00:00:00 EDT 2011
· Physical Review Letters
·
OSTI ID:1100862
+1 more