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Title: Passivation of In0.53Ga0.47As/ZrO2 interfaces by AlN atomic layer deposition process

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4815934· OSTI ID:1093804

Research Organization:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE SC OFFICE OF SCIENCE (SC)
DOE Contract Number:
DE-AC02-98CH10886
OSTI ID:
1093804
Report Number(s):
BNL-101479-2013-JA; R&D Project: LS001
Journal Information:
Journal of Applied Physics, Vol. 114, Issue 3; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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