Atmospheric Pressure Chemical Vapor Deposition of High Silica SiO₂-TiO₂ Antireflective Thin Films for Glass Based Solar Panels

Journal Article · Fri Aug 30 00:00:00 EDT 2013 · Journal of Materials Chemistry. C

DOI:https://doi.org/10.1039/c3tc31465k· OSTI ID:1091653

Klobukowski, Erik R ^[1]; Tenhaeff, Wyatt E ^[1]; McCamy, James ^[2]; Harris, Caroline ^[2]; Narula, Chaitanya Kumar ^[1]

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1. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
2. Solar Performance Group, PPG Industries, Cheswick, PA (United States)

The atmospheric pressure chemical vapor deposition (APCVD) of SiO₂-TiO₂ thin films employing [[(tBuO)₃Si]₂O-Ti(OiPr)₂], which can be prepared from commercially available materials, results in antireflective thin films on float glass under industrially relevant manufacturing conditions. It was found that while the deposition temperature had an effect on the SiO₂:TiO₂ ratio, the thickness was dependent on the time of deposition. This study shows that it is possible to use APCVD employing a single source precursor containing titanium and silicon to produce thin films on float glass with high SiO₂:TiO₂ ratios.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE Office of Energy Efficiency and Renewable Energy (EERE)
• DOE Contract Number: AC05-00OR22725
• OSTI ID: 1091653
• Journal Information: Journal of Materials Chemistry. C, Vol. 1, Issue 41; ISSN 2050-7526
• Publisher: Royal Society of Chemistry
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE