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Title: Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies

Abstract

We fabricated large area (>1 × 1 cm 2), epitaxial Fe nanowire arrays on MgO(001) substrates by nanoimprint lithography with a direct metallization of epitaxial materials through a metallic mask, which avoided the disadvantageous metal-etching process in conventional methods. The magnetization reversals, as revealed by magneto-optic Kerr effect, showed competing effects between Fe cubic magnetocrystalline anisotropy and lithographically induced uniaxial shape anisotropy. Unlike the weakly induced uniaxial anisotropy observed in continuous films, both the magnitude and direction of the uniaxial shape anisotropy can be easily modulated in the nanowires. Complex magnetization reversal processes including two-step and three-step loops were observed when magnetizing the samples along different Fe cubic easy axes, respectively. Finally, these modified magnetization reversal processes were explained by the nucleation and propagation of the domain walls along the non-superimposed easy axes of the competing magnetocrystalline and shape anisotropies.

Authors:
; ;
Publication Date:
Research Org.:
Pacific Northwest National Laboratory (PNNL), Richland, WA (US), Environmental Molecular Sciences Laboratory (EMSL)
Sponsoring Org.:
USDOE
OSTI Identifier:
1087811
Report Number(s):
PNNL-SA-96891
Journal ID: ISSN 0021-8979; JAPIAU; 43695; KP1704020
DOE Contract Number:  
AC05-76RL01830
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 113; Journal Issue: 17; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
Environmental Molecular Sciences Laboratory

Citation Formats

Zhang, Wei, Bowden, Mark E., and Krishnan, Kannan M. Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies. United States: N. p., 2013. Web. doi:10.1063/1.4794358.
Zhang, Wei, Bowden, Mark E., & Krishnan, Kannan M. Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies. United States. doi:10.1063/1.4794358.
Zhang, Wei, Bowden, Mark E., and Krishnan, Kannan M. Tue . "Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies". United States. doi:10.1063/1.4794358.
@article{osti_1087811,
title = {Nanoimprint-lithography patterned epitaxial Fe nanowire arrays with misaligned magnetocrystalline and shape anisotropies},
author = {Zhang, Wei and Bowden, Mark E. and Krishnan, Kannan M.},
abstractNote = {We fabricated large area (>1 × 1 cm2), epitaxial Fe nanowire arrays on MgO(001) substrates by nanoimprint lithography with a direct metallization of epitaxial materials through a metallic mask, which avoided the disadvantageous metal-etching process in conventional methods. The magnetization reversals, as revealed by magneto-optic Kerr effect, showed competing effects between Fe cubic magnetocrystalline anisotropy and lithographically induced uniaxial shape anisotropy. Unlike the weakly induced uniaxial anisotropy observed in continuous films, both the magnitude and direction of the uniaxial shape anisotropy can be easily modulated in the nanowires. Complex magnetization reversal processes including two-step and three-step loops were observed when magnetizing the samples along different Fe cubic easy axes, respectively. Finally, these modified magnetization reversal processes were explained by the nucleation and propagation of the domain walls along the non-superimposed easy axes of the competing magnetocrystalline and shape anisotropies.},
doi = {10.1063/1.4794358},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 17,
volume = 113,
place = {United States},
year = {2013},
month = {1}
}