Method to planarize three-dimensional structures to enable conformal electrodes
Methods for fabricating three-dimensional PIN structures having conformal electrodes are provided, as well as the structures themselves. The structures include a first layer and an array of pillars with cavity regions between the pillars. A first end of each pillar is in contact with the first layer. A segment is formed on the second end of each pillar. The cavity regions are filled with a fill material, which may be a functional material such as a neutron sensitive material. The fill material covers each segment. A portion of the fill material is etched back to produce an exposed portion of the segment. A first electrode is deposited onto the fill material and each exposed segment, thereby forming a conductive layer that provides a common contact to each the exposed segment. A second electrode is deposited onto the first layer.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC52-07NA27344
- Assignee:
- Lawrence Livermore National Security, LLC (Livermore, CA)
- Patent Number(s):
- 8,314,400
- Application Number:
- 13/014,879
- OSTI ID:
- 1080310
- Country of Publication:
- United States
- Language:
- English
Efficiencies of coated and perforated semiconductor neutron detectors
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conference | October 2004 |
6:1 aspect ratio silicon pillar based thermal neutron detector filled with B10
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journal | September 2008 |
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