Indentation of a Punch with Chemical or Heat Distribution at Its Base into Transversely Isotropic Half-Space: Application to Local Thermal and Electrochemical Probes

Journal Article · Tue Jan 01 00:00:00 EST 2013 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4802097· OSTI ID:1080264

Karapetian, E. ^[1]; Kalinin, Sergei V ^[2]

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1. Suffolk University, Boston
2. ORNL

The exact solution to the coupled problem of indentation of the punch, subjected to either heat or chemical substance distribution at its base, into three-dimensional semi-infinite transversely isotropic material is presented. The entire set of field components are derived in terms of integrals of elementary functions using methods of the potential theory and recently obtained, by the authors, results for the general solution of the field equations in terms of four harmonic potential functions. The exact solution for the stiffness relations that relate applied force, total chemical diffusion/heat flux in the domain of the contact, with indenter displacement, temperature, or chemical substance distribution of diffusing species at the base, and materials' chemo/thermo-elastic properties are obtained in closed form and in terms of elementary functions. These results can be used to understand the image formation mechanisms in techniques such as thermal scanning probe microscopy and electrochemical strain microscopy

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Center for Nanophase Materials Sciences (CNMS)
• Sponsoring Organization: USDOE
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 1080264
• Journal Information: Journal of Applied Physics, Vol. 113, Issue 10.1063; ISSN 0021-8979
• Country of Publication: United States
• Language: English