Optical processing furnace with quartz muffle and diffuser plate

Patent · Tue Sep 19 00:00:00 EDT 1995

OSTI ID:106715

Sopori, B L

An optical furnace is disclosed for annealing a process wafer comprising a source of optical energy, a quartz muffle having a door to hold the wafer for processing, and a quartz diffuser plate to diffuse the light impinging on the quartz muffle; a feedback system with a light sensor located in the door or wall of the muffle is also provided for controlling the source of optical energy. The quartz for the diffuser plate is surface etched (to give the quartz diffusive qualities) in the furnace during a high intensity burn-in process. 5 figs.

• Assignee: Midwest Research Inst., Kansas City, MO (United States)
• Patent Number(s): US 5,452,396/A/
• Application Number: PAN: 8-192,383
• OSTI ID: 106715
• Resource Relation: Other Information: PBD: 19 Sep 1995
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
FURNACES
DESIGN
SEMICONDUCTOR MATERIALS
ANNEALING
VISIBLE RADIATION
MATERIALS HANDLING EQUIPMENT