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Title: Student Support for EIPBN 2012 Conference

Abstract

The 56th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 2012, was held at the Hilton Waikoloa Resort in Waikoloa, Hawaii, May 29 - June 2, 2012. The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brought together 483 engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends. Among the emerging technologies that are within the scope of EIPBN is Nanofabrication for Energy Sources along with nanofabrication for the realization of low power integrated circuits. Every year, EIPBN provides financial support for students to attend the conference. The students gave oral and poster presentations of their research and many published peer reviewed articles in a special conference issue of the Journal of Vacuum Science and Technology B. The Department of Energy Office of Basic Energy Sciences partially supported 41 students from US universities with a $5,000.

Authors:
Publication Date:
Research Org.:
New Jersey Institute of Technology, Newark, NJ (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1060876
Report Number(s):
DOE/SC0008346-1
DOE Contract Number:  
SC0008346
Resource Type:
Other
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 36 MATERIALS SCIENCE; Nanofabrication, Lithograpy

Citation Formats

Farrow, Reginald C. Student Support for EIPBN 2012 Conference. United States: N. p., 2013. Web.
Farrow, Reginald C. Student Support for EIPBN 2012 Conference. United States.
Farrow, Reginald C. Tue . "Student Support for EIPBN 2012 Conference". United States. https://www.osti.gov/servlets/purl/1060876.
@article{osti_1060876,
title = {Student Support for EIPBN 2012 Conference},
author = {Farrow, Reginald C},
abstractNote = {The 56th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 2012, was held at the Hilton Waikoloa Resort in Waikoloa, Hawaii, May 29 - June 2, 2012. The EIPBN Conference is recognized as the foremost international meeting dedicated to lithographic science and technology and its application to micro and nanofabrication techniques. The conference brought together 483 engineers and scientists from industries and universities from all over the world to discuss recent progress and future trends. Among the emerging technologies that are within the scope of EIPBN is Nanofabrication for Energy Sources along with nanofabrication for the realization of low power integrated circuits. Every year, EIPBN provides financial support for students to attend the conference. The students gave oral and poster presentations of their research and many published peer reviewed articles in a special conference issue of the Journal of Vacuum Science and Technology B. The Department of Energy Office of Basic Energy Sciences partially supported 41 students from US universities with a $5,000.},
doi = {},
url = {https://www.osti.gov/biblio/1060876}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2013},
month = {1}
}