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Title: Nano-soldering to single atomic layer

Abstract

A simple technique to solder submicron sized, ohmic contacts to nanostructures has been disclosed. The technique has several advantages over standard electron beam lithography methods, which are complex, costly, and can contaminate samples. To demonstrate the soldering technique graphene, a single atomic layer of carbon, has been contacted, and low- and high-field electronic transport properties have been measured.

Inventors:
 [1];  [2]
  1. Berkeley, CA
  2. Kensington, CA
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1029265
Patent Number(s):
8,033,445
Application Number:
12/270,643
Assignee:
The Regents of the University of California (Oakland, CA)
DOE Contract Number:  
AC02-05CH11231
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Girit, Caglar O, and Zettl, Alexander K. Nano-soldering to single atomic layer. United States: N. p., 2011. Web.
Girit, Caglar O, & Zettl, Alexander K. Nano-soldering to single atomic layer. United States.
Girit, Caglar O, and Zettl, Alexander K. Tue . "Nano-soldering to single atomic layer". United States. https://www.osti.gov/servlets/purl/1029265.
@article{osti_1029265,
title = {Nano-soldering to single atomic layer},
author = {Girit, Caglar O and Zettl, Alexander K},
abstractNote = {A simple technique to solder submicron sized, ohmic contacts to nanostructures has been disclosed. The technique has several advantages over standard electron beam lithography methods, which are complex, costly, and can contaminate samples. To demonstrate the soldering technique graphene, a single atomic layer of carbon, has been contacted, and low- and high-field electronic transport properties have been measured.},
doi = {},
url = {https://www.osti.gov/biblio/1029265}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2011},
month = {10}
}

Patent:

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